The Utah Nanofab Cleanroom is open for research!

For access, you need to complete BOTH specific training on the new photolithography tools with Brian Baker, and walk-through safety training with Tony Olsen (see links in the news item below).

This is not to be confused with the GRAND opening, which will occur when we finish moving all functions from MEB to the USTAR cleanroom of the Utah Nanofab.

We have completed installation of the first photolithography tools, including EV 420, photomask patterning (Heidelberg), and several spinners, including one with autodispense.

Over the next few weeks we will be taking down and relocating the remaining research photolithography capability (Suss aligner and wet benches), leaving the teaching lab photolithography capabilities intact until the very last move cycle.