| Chemical Name | Manufacturer | SDS | Chemical Components | HMIS Classification Health hazard / Chronic Health Hazard / Flammability / Physical hazards |
NFPA Rating Health hazard/ Fire / Reactivity Hazard |
GHS Hazards |
|---|---|---|---|---|---|---|
| Zinc Oxide Pieces | Kurt J Lesker Company | Zinc Oxide [Lesker, 24May12] (1) | Zinc Oxide | 1 / n/a / 0 / 0 | 1 / 0 / 0 | |
| Toluene | Sigma-Aldrich | Toluene [Sigma-Aldrich, 06Sep13_v5.2] | Tolune | 2 / * / 3 / 0 | 2 / 3 / 0 | |
| Tris-(8-hydroxyquinoline)aluminum | Sigma-Aldrich | Tris-(8-hydroxyquinoline)aluminum [Sigma-Aldrich, 05Nov12_v5.2] |
Aluminium tris(quinol8-olate
|
2 / n/a / 0 / 0 | 2 / 0 / 0 | |
| Vanadium dioxide | Vanadium dioxide [Generic] | Vanadium Oxide | 2 / n/a/ 0 / 1 | N/A | ||
| WaferBOND | Brewer Science, Inc | WaferBOND [Brewer Science, 16Feb06] | 1-Dodecene / 2-Ethyl-1-Decene / 2-Butyl-1-Octene / Resin solids | 1 / * / 2 / 0 | 1 / 2 / 0 | |
| Titanium(IV) oxide | Sigma-Aldrich | Titanium(IV) oxide [Sigma-Aldrich, 27Feb15_v4.14] | Titanium dioxide / nanoparticles range in size from 1 to 150 nm | 1 / * / 0 / 0 | 2 / 0 / 0 | |
| Trans-LC | Air Products and Chemicals, Inc | Trans-LC [Air Products, 15Feb14_v3.2] | trans-Dichloroethylene | 2 / n/a / 3 / 2 | 2/ 3 / 3 | |
| Titanium dioxide | Sciencelab.com, Inc. | Titanium dioxide [ScienceLab, 21May13] | Titanium dioxide | 1 / n/a / 0 / 0 | 1 / 0 / 0 | |
| Thinner for Photoresists ma-T 1050 | micro resist technology GmbH | Thinner for Photoresists ma-T 1050 [Micro Resist Technology, 01May13_v3] | 2-methoxy-1-methylethyl acetate | 2 / n/a / 2 / 0 | 2 / 2 / 0 | |
| Techni Nickel HT-2 RTU | Teching Inc | Techni Nickel HT-2 RTU [Technic, 02Aug13] | Nickel Sulfate / Boric Acid | 2 / n/a / 0 / 0 | N/A | |
| Tetrahydrofuran | Sigma-Aldrich | Tetrahydrofuran [Sigma-Aldrich, 01Jul14_v4.1] | Tetrahydrofuran | 2 / * / 3 / 0 | 2 / 3 / 0 | |
| Tetrakis(dimethylamino)titanium(IV) | Strem Chemicals, Inc. | Tetrakis(dimethylamino)titanium(IV), 99% TDMAT [Strem, 31Jul16] | Tetrakis(dimethylamino)titanium(IV), 99% TDMAT | 3 / n/a / 3 / 2 | 3 / 3 / 2 | |
| SYLGARD(R) 184 SILICONE ELASTOMER KIT (CURING AGENT) | Dow Corning Corporation | SYLGARD(R) 184 SILICONE ELASTOMER KIT, CURING AGENT [Dow Corning, 25May16_v5] (1) | MixtureChemical / Silicone resin solution | 0 / n/a / 1 / 1 | 0 / 1 / 0 | |
| SYLGARD(R) 184 SILICONE ELASTOMER KIT (BASE | Dow Corning Corporation | SYLGARD(R) 184 SILICONE ELASTOMER KIT, CURING AGENT [Dow Corning, 25May16_v5] (1) | Ethylbenzene | 0 / n/a / 1 / 1 | 0 / 1 / 0 | |
| SU-8 2000 serires resits | micro chem corp | SU-8 2000 Series Resists [MicroChem, 19Mar13] | Epoxy Resin / cyclopentanone / polypropylene carbonate | 2 / n/a / 3 / 0 | 2 / 3 / 0 | |
| Poly(methyl methacrylate) | Sigma Aldrich | Poly(methyl methacrylate) (PMMA) [Sigma-Aldrich, 07Mar14_v4.2] | Poly(methacrylic acid methyl ester) | 0 / n/a / 0 / 0 | 0 / 0 / 0 | |
| SULFAMATE NICKEL SN-10 | MANUFACTURER: TRANSENE COMPANY, INC. | SULFAMATE NICKEL SN-10 [Transene, 01Aug13] | Nickel Sulfamate / Boric Acid / Nickel Chloride / Water < | 2 / 0 / 0 | 1 / 0 / 0 | |
| SU-8 Series Resists | Micro Chem | SU-8 Series Resists [MicroChem, 12Dec01] | Gamma Butyrolactone (CAS: 96-48-0); 22-60%Mixed Triarylsulfonium/ Hexafluoroantimonate Salt; (CAS: 89452-37-9)/(CAS: 71449-78-0) / Propylene Carbonate (CAS: 108-32-7); 1-5%Epoxy Resin (CAS: 28906-96-9); 35-75% | 2 / n/a / 1 / 0 | 2 / 1 / 0 | |
| SR-351 | Sartomer Company Inc | SR351 [Sartomer, 29Jun11] | Trimethylolpropane Triacrylate | n/a | 2 / 1 / 1 | |
| SU-8 3000 Series Resists | Micro Chem | SU-8 3000 Series Resists [MicroChem, 13Apr09] | Cyclopentanoneiorm-aldehyde / polymer with (chloromethyl)oxirane or4 4 / r”i-Q-methylethylidene)by[Ohengl]sulfonium / (thiodl-q,l-phenytene) bis[diphenyl- / (oC-6-l l)-hexaJluoroantimonde (l) (l:2)Suifonium / diphenyl[4-(phenylthio)phenylJ- / QC-6-l I)-hexaJluoroantimonde(I) (I: l)’ Hazard statements | 3 / 2 / 0 | 3 / 2 / 0 | |
| SU-8 Developer | Micro Chem | SU-8 Developer [MicroChem, 06Nov08] | 1-Methoxy-2-propanol acetate (CAS: 108-65-6)/ >99.5% Synonym: propylene glycol monomethyl ether acetate 2-Methoxy-1-propanol acetate (CAS: 70657-70-4)/ <0.5% | 1 / 2 / 0 | ||
| Sodium beta alumina | Materials & Systems Research, Inc. | Sodium beta alumina [MSRI, 14Nov13] | Sodium beta alumina | n/a | n/a | |
| Silver Conductive Epoxy Adhesive B: Moderate Cure/HighConductivity | MG Chemicals | SILVER CONDUCTIVE EPOXY ADHESIVE 8331-PART B [MG Chemicals, 14Jan13_v2.01] | silver / 4-nonylphenol, branched / 2-piperazin-1-ylethylamine / Diethylene triamine, reaction product with diglycidyl ether of Bisphenol A/ Diethylenetriamine / 4,4′-isopropylidene-diphenolv | 3 / 1 / 0 | 3 / 1 / 0 | |
| SILQUEST A-174 SILANE | Momentive Performance Materials -Sistersville | SILQUEST A-174 SILANE [Momentive, 01Sep16_v1.2] | MEQUINOL | 2 / 1 / 1 | n/a | |
| Silver Conductive Epoxy Adhesive A: ModerateCure/ High Conductivity | MG Chemicals | SILVER CONDUCTIVE EPOXY ADHESIVE 8331-PART A [MG Chemicals, 14Jan13_v2.01] | silver>5 g/kgGuinea Pig / 4′-methylenebis [N,N-bis(2-oxiranylmethyl) aniline | n/a | n/a | |
| Silane-Poly (Ethylene Glycol)-Silane | Layson Bio inc | Silane-Poly (Ethylene Glycol)-Silane, Average MW 3400 [Laysan Bio, 01Apr13] | n/a | n/a | n/a | |
| QuickSet Acrylic Powder | Allied High Tech Products, Inc | Quickset Acrylic Powder [Allied, 01Jan13] | Benzoyl Peroxide<2% / Polyethylmethacrylate<99% | 1 / n/a / 1 / 0 | n/a | |
| PTZ Sol-Gel Solution | Mitsubishi | PZT Sol-Gel Solution N-Series [Mitsubishi, 06Jun14] | Lead di(acetate) / >Zicronium tetrabutanolate / Titanium tetraisopropanolate /Ethanol /Butan-1-ol / Octane-1-ol / Proylene glycol | n/a | n/a | |
| Saccharin | Sigma-Aldrich | Saccharin [Sigma-Aldrich, 19Apr13_v5.2] | 1,2-Benzisothiazol-3(2H)-one 1,1-dioxide | 0 / * / 0 / 0 | 0 / 0 / 0 | |
| PSI-5A4E & PSI-5H4E | Piezo Systems, Inc. | PSI-5A4E & PSI-5H4E [Piezo Systems, 04Jan13] | Lead Oxide / Zirconium Oxide / Titanium Oxide / Lanthanum Oxide / Niobium Oxide / Nickel Oxide | n/a | n/a | |
| Pyrex Borosilicate Glass GC-7740 | Corning Incorporated | Pyrex Borosilicate Glass, GC-7740 [Corning Incorporated, 06Nov02_v2] | Glass, oxide/ chemicals | n/a | n/a | |
| Polyvinylpyrrolidone | Sigma Aldrich | Polyvinylpyrrolidone [Sigma-Aldrich, 08May12_v4.2] | 0 / n/a / 0 / 0 | 0 / 0 / 0 | ||
| Propylene glycol monomethyl ether acetate | Sigma Aldrich | Propylene glycol monomethyl ether acetate (PGMEA) [Sigma-Aldrich, 26Nov12_v4.8] | 2-Methoxy-1-methylethyl acetate | 0 / 2 / * / 0 / 0 | 0 / 2 / 0 | |
| PositivePhotoResist–KL5300 | KemLab | Positive PhotoResist – KL5300 [KemLab, 27Feb15_v1] | Electronic grade propylene glycol monomethyl ether acetate108-65-6>60.0%Mixed cresol novolak resin<25.0%Diazo Photoactive Compound<4.0%Fluorinated Surfactant<1.0%Cresol | n/a | 2 /2 / 0 | |
| Poly[4,5-difluoro-2,2-bis(trifluoromethyl)-1,3-dioxole-co-tetrafluoroethylene] | Sigma-Aldrich | Poly[4,5-difluoro-2,2-bis(trifluoromethyl)-1,3-dioxole-cotetrafluoroethylene] [Sigma-Aldrich, 23May12_v5] | Poly(Disperse Red 1 acrylate) | 0 / 0 / 0 / 0 | 0 / 0 / 0 | |
| Poly(Disperse Red 1 methacrylate) | Sigma Aldrich | Poly(Disperse Red 1 methacrylate) [Sigma-Aldrich, 31Mar14_v4.1] | n/a | 0 / 0 / 0 / 0 | 0 / 0 / 0 | |
| Poly(3,4-ethylenedioxythiophene)-poly(styrenesulfonate) | Sigma-Aldrich | Poly(3,4-ethylenedioxythiophene)-poly(styrenesulfonate) (PEDOT) [Sigma-Aldrich, 02Jul14_v4.3] | Ethylene glycol / Benzenesulfonic acid, ethenyl-, homopolymer, compd. with 2,3-dihydrothieno[3,4-b]-1,4-dioxin homopolymer | 3 / * / 0 / 0 | 3 / 0 / 0 | |
| PMGI SFG Series Resists | MicroChem Corp. | PMGI SFG Series Resists [MicroChem, 20Aug13] | 1-methoxy-2-propanolCyclopentanone | 2 / n/a / 3 / 0 | 2 / 3 / 0 | |
| Phosphosilicate Solution | Filmtronics Inc. | Phosphosilicate Solution [Filmtronics, 01Oct15_v2] | Ethanol / Phosphorus Polymer Ingredient #2v / Phosphorus Polymer Ingredient #1 | n/a | n/a | |
| PI 2611 | HD MicroSystems™ | PI 2611 [HD Microsystems, 02Jan14_v2.2] (1) | N-Methyl-2-pyrrolidone / Polyimide | n/a | n/a | |
| PLATINUM-DIVINYLTETRAMETHYLDISILOXANECOMPLEX | GELEST, INC. | PLATINUM – DIVINYLTETRAMETHYLDISILOXANE COMPLEX in XYLENE – SIP6831.2 [Gelest, 17Aug07] | PLATINUM – DIVINYLTETRAMETHYLDISILOXANE COMPLEX / XYLENE | 2 / 1 / 0 | n/a | |
| PFA Fluoropolymer Resin | DuPont | PFA Fluoropolymer Resin [Dupont, 12Jun12_v4] | Tetrafluoroethylene/perfluoroalkylvinylether copolymer | 2 / 1 / 0 | 0 / 0 / 0 | |
| PMGI 101A Developer | MicroChem Corp | PMGI 101A Developer [MicroChem, 19Apr12] | tetraethylammonium hydroxide | 2 / 0 / 0 | 2 / 0 / 0 | |
| Phosphosilicate Solution | Filmtronics Inc | Phosphosilicate Solution [Filmtronics, 01Oct15_v2] (1) | Ethanol / Phosphorus Polymer Ingredient #2 / Phosphorus Polymer Ingredient #1 / Water | n/a | n/a | |
| PA-401D | HD MicroSystems | PA-401D [HD Microsystems, 03Jan07] | Cyclopentanone | n/a | n/a | |
| Pelco® Colloidal Silver | Ted Pella, Inc. | Pelco® Colloidal Silver [Ted Pella, 01Apr09] | Silver (7440-22-4)* / Arcosolve PM (107-98-2) / Toluene (108-88-3) / Ethanol (64-17-5) / Ethyl Acetate (141-78-6 | 1 / 3 / 0 | 1 / 3 / 0 | |
| PA 400 R | HD MicroSystems™ | PA 400 R [HD Microsystems, 21Feb13_v2.2] | 1-Methoxy-2-propyl acetate | n/a | n/a | |
| Omnicoat | Micro chem corp | OmniCoat [MicroChem, 22Aug13] | Cyclopentanone / 1- methoxy – propanol | 2 / 3 / 0 | 2 / 3 / 0 | |
| JSR KRF M91Y | JSR Micro, Inc | JSR KRF M91Y [JSR Micro, 08Jul11_v10] | Polyhydroxystyrene derivative/ Proprietary Sulfonyl compound / Proprietary Ethyl lactate (EL) / Propyleneglycolmonomethyletheracetate (PGMEA) | n/a | n/a | |
| N,N′-Bis(3-methylphenyl)-N,N′-diphenylbenzidine | Sigma Aldrich | N,N′-Bis(3-methylphenyl)-N,N′-diphenylbenzidine (TPD) [Sigma-Aldrich, 30Jul14_v5.6] | C38H32N2 | 0 / 0 / 0 | 0 / 0 / 0 | |
| Nickel(II) sulfamate tetrahydrate | Sigma Aldrich | Nickel(II) sulfamate tetrahydrate [Sigma-Aldrich, 19Sep12_v3.4] | Nickel bis(sulphamidate) tetrahydrate | 2 / * / 0 / 0 | 2 / 0 / 0 | |
| Nickel(II) oxide | Sigma Aldrich | Nickel(II) oxide [Sigma-Aldrich, 28Feb15_v4.1] | Nickel monoxide | 2 / * / 0 / 0 | 2 / 0 / 0 | |
| NITRIC ACID SOLUTIONS, 0.4% 50% V/V, 0.1N6.0N | Labchem | NITRIC ACID SOLUTIONS, 0.4-50% V_V, 0.1-6.0N [Grainger, 13Aug07] | Water / Nitric Acid | n/a | n/a | |
| N,N′-Bis(3-methylphenyl)-N,N′-diphenylbenzidine | Sigma-Aldrich | N,N′-Bis(3-methylphenyl)-N,N′-diphenylbenzidine (TPD) [Sigma-Aldrich, 04Jul13_v5.3] | C38H32N2 | 0 / 0 / 0 / 0 | 0 / 0 / 0 | |
| mr-I 8000R Series Imprint Polymer | micro resist technology GmbH | mr-I 8000R Series Imprint Polymer [Micro Resist Technology, 30Apr13_v3.01] | 62-methoxy-1-methylethyl acetate | 2 / 2 / 1 | 2 / 2 / 1 | |
| Molybdenum(IV) sulfide | Sigma-Aldrich | Molybdenum(IV) sulfide [Sigma-Aldrich, 07Apr15_v3.8] | Molybdenum(V) sulfide | 0 / 0 / 0 | 0 / 0 / 0 | |
| MICROPOSIT™ SC™ 1827 POSITIVE PHOTORESIST | ROHM AND HAAS ELECTRONIC MATERIALS LLCA Subsidiary of The Dow Chemical Company | MICROPOSIT™ SC™ 1827 POSITIVE PHOTORESIST [Rohm Haas, 02Apr04_v3] | iazo Photoactive Compound1.0 / Nonionic surfactant / Mixed cresol novolak resin10.0 / Electronic grade propylene glycol monomethyl ether acetate / Cresol | n/a | 2 / 2 / 0 | |
| MICROPOSIT™MF™-CD-26 DEVELOPER | ROHM AND HAAS ELECTRONIC MATERIALS LLCA Subsidiary of The Dow Chemical Company | MICROPOSIT™ MF™ -CD-26 DEVELOPER [Dow, 20Aug12_v1.1] | Tetramethylammonium hydroxide | n/a | 3 / 0 / 0 | |
| MICROPOSIT™S1805™POSITIVE PHOTORESIST | ROHM AND HAAS ELECTRONIC MATERIALS LLCA Subsidiary of The Dow Chemical Company | MICROPOSIT™ S1805™ POSITIVE PHOTORESIST [Rohm Haas, 08Apr11_v3.2] | Electronic grade propylene glycol monomethyl ether acetate / Mixed cresol novolak resin / Diazo Photoactive Compound / Creso / Fluoroaliphatic Polymer Esters | n/a | 2 / 2 / 0 | |
| AZ 5214-E IR Photoresist | EMD performance materials corp | AZ 5214-E IR Photoresist [AZ Electronic Materials, 04Oct12_v3.2] | 1- Methoxy-2-propanal acetate / Diazonaphtoquinonesofulnic esters | 2 / 2 / 0 | 2 / 2 / 0 | |
| Molybdenum (IV) sulfide | MTI Corporation | Molybdenum (IV) sulfide [MTI Corporation] | Molybdenum (IV) sulfide | 1 / 0 / 1 | n/a | |
| MICROPOSIT™351 DEVELOPER | ROHM AND HAAS ELECTRONIC MATERIALS LLCA Subsidiary of The Dow Chemical Company | MICROPOSIT™ 351 Developer [Dow Corning, 11Mar15_v2] | Aqueous solution of inorganic compounds | n/a | 3 / 0 / 1 | |
| MICROPOSIT(TM) MF(TM) -319 Developer | Rohm and Haas Electronic Materials LLC | MICROPOSIT(TM) MF(TM) -319 Developer [Rohm Haas, 01Jan04_v2] | Water / Surfactant / Tetramethylammonium hydroxide | n/a | 3 / 0 / 0 | |
| MICROPOSIT S1813 PHOTO RESIST | Shipley Company | MICROPOSIT S1813 PHOTO RESIST [Shipley, 11Jun98] | Electronic grade propylene glycol monomethylether acetate / Mixed cresol novolak resin / Fluoroaliphatic Polymer Esters / Diazo Photoactive Compound / cresol | n/a | 2 / 2 / 0 | |
| METHYL ISOBUTYL KETONE | Mallinckrodt Baker, Inc | METHYL ISOBUTYL KETONE [Mallinckrodt Baker, 06Jul06] | Methyl Isobutyl Ketone | 2 / 3 / 2 | 2 / 3 / 2 | |
| LOR B Series Resists | MicroChem Corporation | LOR B Series Resists [MicroChem, 18Dec08] | Cyclopentanone (CAS: 120-92-3); 65-90%. Propylene glycol monomethyl ether (107-98-2); 10-15% Polyaliphatic imide copolymer (CAS: 102322-80-5); 1-20% Proprietary Dye ; 0.1 – 2% Proprietary Surfactant; <1% | n/a | 2 / 3 / 0 | |
| MEGAPOSIT™SPR™220-7.0 POSITIVE | THE DOW CHEMICAL COMPANY*Agent for Rohm and Haas Chemicals LLC | MEGAPOSIT™ SPR™ 220-7.0 POSITIVE [Rohm Haas, 24Mar15]< a> | Cresol novolak resin / Ethyl lactate / %Anisole / Diazo Photoactive Compound / Methyl Butyl Acetate / n-amyl acetate / Cresol / Organic Siloxane Surfactant / Dioxane | n/a | 2 / 2 / 0 | |
| LOR B Series Resists | MicroChem Corporation | LOR B Series Resists [MicroChem, 18Dec08] (1) | Cyclopentanone (CAS: 120-92-3); 65-90%. Propylene glycol monomethyl ether (107-98-2); 10-15% Polyaliphatic imide copolymer (CAS: 102322-80-5); 1-20% Proprietary Dye ; 0.1 – 2% Proprietary Surfactant; <1% | n/a | 2 / 3 / 0 | |
| Methyl Isobutyl Ketone | Fisher Scientific | Methyl Isobutyl Ketone [Fisher Scientific, 01Nov12_v2] | Methylisobutyl ketone | n/a | n/a | |
| Lead Zirconium Titanate Sputtering Target | American Elements | Lead Zirconium Titanate Sputtering Target [American Elements, 21Dec10] | Lead Zirconium Titanate | 1 / 0 / 0 | 1/ 0 / 0 | |
| Iron(II,III) oxide | Sigma Aldrich | Iron(II,III) oxide [Sigma-Aldrich, 15Dec14_v4.6] | Iron (II/III) Oxide | 0 / 0 / 0 | 0 / 0 / 0 | |
| Irgacure® PAG103 | BASF CORPORATION | Irgacure® PAG103 [BASF, 16Sep10_v1.2] | Benzeneacetonitrile derivative | n/a | n/a | |
| Iron(III) p-toluenesulfonate hexahydrate | Sigma-Aldrich | Iron(III) p-toluenesulfonate hexahydrate [Sigma-Aldrich, 04Sep12_v5] | Iron(III) p-toluenesulfonate hexahydrate | 2 / 0 / 0 | ||
| JSR ARF AM 2073J-19 | JSR Micro, Inc. | JSR ARF AM 2073J-19 [JSR Micro, 15Apr09_v5] | Fluorinated poly(meth)acrylate (FARM) 5-25 Proprietary Alicyclic carboxylic ester 0-5 Proprietary Photoacid Generator 0.1-3 Proprietary Propylene glycol monomethyl ether acetate (PGMEA) | n/a | 1 / 2 / 0 | |
| HD 4100 | HD MicroSystems™ | HD 4100 [HD Microsystems, 03Jun14_v2.1] | N-Methyl-2-pyrrolidone 872-50-4 50 – 60 % Polyamic Acid Ester 30 – 40 % 3,6,9-Trioxaundecamethylene dimethacrylate 109-17-1 1 – 10 % Aromatic Oxime | n/a | n/a | |
| Isopropyl alcohol | Sigma-Aldrich | Isopropyl alcohol [Sigma-Aldrich, 06Mar15_v5.8] | 2-Propanol | 2 / * / 3 / 0 | 2 / 3 / 0 | |
| Indium tin oxide coated PET | Sigma Aldrich | Indium tin oxide coated PET [Sigma-Aldrich, 05mApr14_v4.1] | Diindium trioxide / Tin(IV) oxide | 2 / * / 0 / 0 | 2 / 0 / 0 | |
| Indium metal pieces | Kurt J Lesker Company | Indium metal [Lesker, 29Mar12] | Indium | 0 / 0 / 0 | 0 / 0 / 0 | |
| Indium Oxide-Tin Oxide Alloy Pieces | Kurt J Lesker Company | Indium Oxide-Tin Oxide Alloy [Lesker, 30Apr12] | Indium Oxide / Tin(IV) Oxide | 0 / 0 / 0 | 1 / 0 / 0 | |
| INDIUM ANTIMONIDE | 5N Plus Fairfield Inc | INDIUM ANTIMONIDE [SN Plus Fairfield, 10Feb13] | INDIUM ANTIMONIDE | n/a | n/a | |
| HD-4104 | HD MicroSystems | HD-4104 [HD Microsystems, 01Oct09] | n-Methylpyrrolidone / Esterified Polyamic Acid Resin / Acrylate Ester / Proprietary Ingredient(s) / Proprietary Ingredient(s) | n/a | n/a | |
| Gold etchant, standard | Sigma Aldrich | Gold etchant, standard [Sigma-Aldrich, 25Dec12_v4] | Potassium iodide / Iodine | 3 / * / 1 / 0 | 3 / 1 / 0 | |
| Fluorinert® FC-770 | Sigma-Aldrich | Fluorinert® FC-770 [Sigma-Aldrich, 17Apr13_v3.3] | Fluorinert | 0 / 0 / 0 | 0 / 0 / 0 | |
| Gadolinium metal pieces | Kurt J Lesker Company | Gadolinium metal [Lesker, 29Mar12_v1] | Gadolinium | 1 / 1 / 1 | 1 / 1 / 1 | |
| ETHYLENE GLYCOL | Avantor Performance Materials, Inc. | ETHYLENE GLYCOL [Avantor, 19Jun14_v1] | ETHYLENE GLYCOL | n/a | 2 / 1 / 0 | |
| Gallium–Indium eutectic | Sigma Aldrich | Gallium–Indium eutectic [Sigma-Aldrich, 03Jul14_v4.5] | Gallium“Indium eutectic | 3 / 0 / 0 | 3 / 0 / 0 | |
| ELEVATE CU 6340 CARRIER | TECHNIC INC. | ELEVATE CU 6340 CARRIER [Technic, 17Sep10] | Copper sulfate | 1 / 0 / 0 | 1 / 0 / 0 | |
| Ethanol 200 Proof | Decon Laboratories, Inc. | Ethanol 200 Proof [Decon Labs, 18Jul14] | Ethyl Alcohol | 1 / 3 / 0 | 1 / 3 / 0 | |
| Aluminum Oxide Pieces | Kurt J Lesker Company | Aluminum Oxide Pieces [Lesker, 18Sep12_v1] | aluminum Oxide | n/a | n/a | |
| Cadmium telluride | Sigma-Aldrich | Cadmium telluride [Sigma-Aldrich, 07Mar15_v5.5] | Cadmium telluride | 2 / * / 0 / 0 | 2 / 0 / 0 | |
| ELEVATE CU 6340 BRIGHTENER | TECHNIC INC. | ELEVATE CU 6340 BRIGHTENER [Technic, 22Apr10] | Copper sulfate / Sulfuric acid / Acrylamide | 2 / 0 / 0 | n/a | |
| DIELECTRIC COATING DC4-500 | Futurrex, Inc | DIELECTRIC COATING DC4-500 [Futurrex, 28Oct11] | n-Butano / polysiloxane resin | 1 / 3 / 0 | n/a | |
| CGI 725 | BASF CORPORATION | CGI 725 [BASF, 06Nov13_v1] | This product is not regarded as hazardous under current OSHA Hazard Communication standard; CFR 29 Part 1910.1200. | 1 / 1 / 0 | 1 / 1 / 0 | |
| AZ P4210 | AZ electronic materials USA corp. | AZ P4210 Photoresist [AZ Electronic Materials, 08Nov11_v3.2] | 1-Methoxy-2-propanol acetate / Diazonaphthoquinonesonic ester / resol novolak resin | 2 / 2 / 0 | 2 / 2 / 0 | |
| Cytop CLT-809M | Asahi glass.co | hydrogen / fluoride / perfluoro isobutylene | Cytop CTL-809M [Asahi Glass, 02Dec02] | n/a | n/a | |
| Cyclohexanol | Sigma-Aldrich | Cyclohexanol [Sigma-Aldrich, 18Sep13_v5.2] | Cyclohexanol | 2 / * / 2 / 0 | 2 / 2 / 0 | |
| Corning® EAGLE XG™ glass substrates | Corning Display Technologies | Corning® EAGLE XG™ glass substrates [Corning, 09Feb06_v3] | glass / Oxide / Chemicals | 1 / 0 / 0 | n/a | |
| COPPER ETCHANT APS-100 | TRANSENE COMPANY, INC. | COPPER ETCHANT APS-100 [Transene, 01Sep13_v8 GHS] | MaterialAmmonium peroxydisulfate / Water | 2 / 0 / 3 | n/a | |
| Chlorotrimethylsilane | Sigma-Aldrich | Chlorotrimethylsilane [Sigma-Aldrich, 17Jun15_v4.1] | Chlorotrimethylsilane | 3 / * / 3 / 0 | 3 / 3 / 0 | |
| Chloroform | Sigma-Aldrich | Chloroform [Sigma-Aldrich, 19Jul13_v4.3] | Chloroform / Ethanol | 2 / * / 0 / 0 | 2 / 0 / 0 | |
| BTE_MSDS | American Chemical Society | BTE_MSDS_Apratim_Majumder | Bithiophene | n/a | n/a | |
| Azobenzene | Sigma-Aldrich | Azobenzene [Sigma-Aldrich, 26Nov14_v4.5] | Azobenzene / | 2 / * / 1 / 0 | 2 / 1 / 0 | |
| AZ 9260 PHOTORESIST (520 CPS) | EMD performance materials corp | Azobenzene [Sigma-Aldrich, 26Nov14_v4.5] | 1-Methoxy-2-propanol acetate / Diazonaphthoquinonesulfonic esters / Methoxy-1-propanol acetate / Cresol novolak resin | 2 / 2 / 0 | m2 / 2 / 0 | |
| AZ nLOF 2020 Photoresist | EMD performance materials corp | 1-Methoxy-2-propanol acetate / Modified melamine-formaldehyde resin/ 2 – Methoxy-1- propanol acetate / Formaldehyde | 2 / 2 / 0 | 2 / 2 / 0 | ||
| AZ nLOF®2070 Photoresist | Merck Performance Materials GmbH | AZ nLOF® 2070 Photoresist [Merck, 17Apr15_v1.1] | 1,3-Benzenedimethanol, 2-hydroxy-5-(1,1,3,3-tetramethylbutyl)- | n/a | n/a | |
| AZ Developer 1:1 | AZ electronic materials USAcorp | AZ Developer 1to1 [AZ Electronic Materials, 18Dec09_v1] | sodium metasilicate | 2 / 0 / 0 | 2 / 0 / 0< | |
| 1H,1H,2H,2H-Perfluorooctyltriethoxysilane | Sigma-Aldrich | 1H,1H,2H,2H-Perfluorooctyltriethoxysilane [Sigma-Aldrich, 21Nov12_v5] | 1H, 1H, 2H, 2H-Perfluorooctyl Triethoxysilane | 2 / 1 / 0 | 2 / 1 / 0 | |
| AZ 50XT Photoresist | EMD Performance Materials Corp. | AZ 50XT Photoresist [AZ Electronic Materials, 24Dec14_v4] | 1-Methoxy-2-propanol acetate / Diazonaphthoquinonesulfonic esters / Methoxy-1-propanol acetate / Cresol novolak resin | 2 / 2 / 0 | 2 / 2 / 0 | |
| Anisole | Sigma-Aldrich | Anisole [Sigma-Aldrich, 04Jul13_v3.6] | Anisole | 1 / 2 / 0 | 0 / 2 / 0 | |
| Antimony | Sigma-Aldrich | Antimony [Sigma-Aldrich, 01Jul14_v5.2] | Boron | 1 / 0 / 0 | 1 / 0 / 0 | |
| AZ 1505 Photoresist | AZ Electronic Materials (Germany) GmbH | AZ 1505 Photoresist [AZ Electronic Materials, 09Apr13_v33] | 1-Naphthalenesulfonic acid, 6-Diazo-5,6-dihydro-5-oxo-, ester with phenyl(2,3,4-trihydroxyphenyl)methanone / | n/a | n/a | |
| 950 PMMA Series Resists in Chlorobenzene | MicroChem Corp | 950 PMMA Series Resists in Chlorobenzene [MicroChem, 19Apr12] | chlorobenzene / Poly(methylmethacrylate) | 2 / 3 / 0 | 2 / 3 / 0 | |
| A Thinner | Micro Chem corp | A Thinner [MicroChem, 02May17_v1] | 100 – 66 -3 anisole | 1 / 2 / 0 | 1 / 2 / 0 | |
| Acetone | Alfa AesarThermo Fisher Scientific Chemicals, Inc. | Acetone [Alfa Aesar, 23Nov15_v1] | Acetone | 1 / 3 / 0 | 1 / 3 / 0 | |
| 6061_Al2O3_22P-T6P | Alcoa Inc | 6061_Al2O3_22P-T6P [Alcoa, 20Jan06_v2] | Aluminium / Aluminium Oxide / Chromium | n/a | n/a | |
| 495 PMMA Series Resists in Anisole | MicroChem Corp. | 495 PMMA Series Resists in Anisole [MicroChem, 10Oct14] | Anisole / Poly(methyl methacrylate) | 1 / 2 / 0 | 1 / 2 / 0 | |
| 950 PMMA Series Resists in Anisole | MicroChem Corporation | 950 PMMA Series Resists in Anisole [MicroChem, 06Nov08] | Anisole / Poly(methylmethacrylate) | n/a | 1 / 2 / 0 | |
| 4-Methyl-2-pentanone | Sigma-Aldrich | 4-Methyl-2-pentanone [Sigma-Aldrich, 04Jun13_v5.1] | 4-Methylpentan-2-one | 2 / * / 3 / 0 | 2 / 3 / 0 | |
| 25-35% (METHYLHYDROSILOXANE) 65-70% (DIMETHYLSILOXANE) COPOLYMER – HMS-301 | GELEST, INC. | 25-35% (METHYLHYDROSILOXANE) 65-70% (DIMETHYLSILOXANE) COPOLYMER – HMS-301 [Gelest, 31Jul02] | 25-35%(METHYLHYDROSILOXANE)65-70%(DIMETHYLSILOXANE) COPOLYMER | n/a | n/a | |
| 2-Propanol | Sigma-Aldrich | 2-Propanol [Sigma-Aldrich, 18Jun14_v5.5] | 2-Propanol | 2 / * / 3 / 0 | 2 / 3 / 1 | |
| 4-Methyl-2-pentanone | Sigma-Aldrich | 4-Methyl-2-pentanone [Sigma-Aldrich, 02Jul14_v5.5] | 4-Methylpentan-2-one | 2 / * / 3 / 0 | 2 / 3 / 0 | |
| 3,4-Ethylenedioxythiophene | Sigma-Aldrich | 3,4-Ethylenedioxythiophene (EDOT) [Sigma-Aldrich, 28Dec12_v5] | 3,4-Ethylenedioxythiophene | 2 / * / 1 / 0 | 2 / 1 / 0 | |
| 3-ACRYLOXYPROPYLTRICHLOROSILANE -SIA0199.0 | GELEST, INC. | 3-ACRYLOXYPROPYLTRICHLOROSILANE – SIA0199.0 [Gelest, 05Jun04] | 3-ACRYLOXYPROPYLTRICHLOROSILANE / other ingredients | 3 / 1 / 1 | n /a | |
| 1-Octanol | Sigma-Aldrich | 1-Octanol [Sigma-Aldrich, 02Jul14_v3.4] | Octan-1-ol | 2 / * / 2 / 0 | 2 / 2 / 0 | |
| 1-Butanol | Sigma-Aldrich | 1-Butanol [Sigma-Aldrich, 27Apr12_v3.5] | n-Butano | 2 / * / 3 / 0 | 2 / 3 / 0 | |
| 2,4,6,8-Tetramethyl-2,4,6,8-tetravinylcyclotetrasiloxane | Sigma Aldrich | 2,4,6,8-Tetramethyl-2,4,6,8-tetravinylcyclotetrasiloxane [Sigma-Aldrich, 04Apr14_v5.1] | 2,4,6,8-Tetramethyl-2,4,6,8-tetravinylcyclotetrasiloxane | 2 / * / 1 / 0 | 2 / 1 / 0 | |
| 1-Methyl-2-pyrrolidinone | Sigma-Aldrich | 1-Methyl-2-pyrrolidinone [Sigma-Aldrich, 26Feb15_v5.5] | N-methyl-2-pyrrolidone | 2 / * / 2 / 0 | 2 / 2 / 0 | |
| 7-8% VINYLMETHYLSILOXANE)(DIMETHYLSILOXANE) COPOLYMER, TRIMETHYLSILYL TERMINATED – VDT-731 | GELEST, INC. | 1-Methyl-2-pyrrolidinone [Sigma-Aldrich, 26Feb15_v5.5] | (7-8% VINYLMETHYLSILOXANE)(DIMETHYLSILOXANE) COPOLYMER, TRIMETHYLSILYL TERMINATED / OCTAMETHYLCYCLOTETRASILOXANE | 1 / 1 / 0 | n/a | |
| IP-S Photoresist | Nanoscribe GmbH | MSDS_IP-S%20Photoresist_2017_V1.pdf | Carbamate-, methacrylate, mixture | Skin irritation cat. 2 Skin sensitisation cat. 1 Eye irritation cat. 2 Hazardous to the aquatic environment: chronical, cat. 3 |
n/a | |
| IP-Dip Photoresist | Nanoscribe GmbH | MSDS_IP-Dip%20Photoresist_2017_V1.pdf | Carbamate-, methacrylate, mixture | Skin irritation cat. 2 Skin sensitisation cat. 1 Eye irritation cat. 2 Hazardous to the aquatic environment: chronical, cat. 3 |
n/a | |
| IP-Dip Photoresist | Nanoscribe GmbH | MSDS_IP-L%20780%20Photoresist_2017_V1.pdf | Aliphatic alcohol, containing acrylate | Skin irritation cat. 2
Eye irritation cat. 2 Skin sensitisation cat. 1 |
n/a | |
| Buffer HF improved | Transene Company, inc | http://www.kni-lab.caltech.edu/resources/msds/liquid/buffered-hf-improved-Transene-07002013.pdf | Hydrofluoric Acid / Ammonium Acid / Ammonium fluoride / water | 4 / 0 / 0 | 3/ 0 / 1 | |
| PREFERENTIAL SILICON ETCHANT PSE-200 | Transene Company, inc | http://www.smfl.rit.edu/pdf/msds/sds_PSE200.pdf | Potassium Hydroxide / Water | n/a | 3/ 0 / 2 | |
| AZ 400K Developer | AZ Electronic Materials USA Corp. | https://uwaterloo.ca/giga-to-nanoelectronics-centre/sites/ca.giga-to-nanoelectronics-centre/files/uploads/files/az400k_developer_msds.pdf | Potassium Hydroxide / Potassium bromates / Water | 2 / 0 / 0 / x | 2 / 0 / 0 / n/a | |
| LPKF Activator 310 | LPKF | https://www.nanofab.utah.edu/documents/2024/07/sds-lpkf-activator-310.pdf | Water / Carbon Black / Potassium Carbonate / Potassium Hydroxide /2,2′,2”-(hexahydro-1,3,5-triazine-1,3,5-triyl)triethanol | not listed | not listed | Skin Irrit 2/ Skin Sens 1/ Eye Irrit 2 |
| LPKF Cleaner 110 | LPKF | https://www.nanofab.utah.edu/documents/2024/07/lpkf-cleaner-110.pdf | Ethoxylated Alcohols / Sodium metaborate, anhydrous / Hexanedioic acid, polymer with N1 (2-aminoethyl) 1,2 ethanediamine / reaction products with dimethylamine and epichlorohydrin / | not listed | not listed | Eye Dam, 1/ Repr. 2/ Aquatic Acute |
| LPKF Cleaner 210 | LPKF | https://www.nanofab.utah.edu/documents/2024/07/sds-lpkf-cleaner-210.pdf | Sodium metaborate, anhydrous / Hexanedioic acid, polymer with N1 (2-aminoethyl) 1,2 ethanediamine / reaction products with dimethylamine and epichlorohydrin / | not listed | not listed | Eye Dam, 1/ Repr. 2/ Aquatic Acute 1 |
| LPKF Shine 410 | LPKF | https://www.nanofab.utah.edu/documents/2024/07/sds-lpkf-shine-410.pdf | / / / | not listed | not listed | / / |
| RSE-100 | Transene | / / / | / / | |||
| RSE-200 | Transene | https://www.nanofab.utah.edu/documents/2024/08/sds-rse-200.doc | 5:6:3 Nitric / HF / Acetic / | / / |