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  • Cleanroom

    • Equipment & Capabilities

    • Become a member and get access to the cleanroom

    • Service Request

    • Staff Consultation

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    • PDF Equipment List

    • Equipment Links

    • Fabrication Procedures

      • Photolithography Spin/Bake/Expose/Develop

        • +S1813 Photoresist

        • nLOF 2020 Photoresist

        • LOR 10B Photoresist

        • AZ 9260 Photoresist

  • EM Surface Analysis Lab

    • Get Access to the Electron Micrsocopy and Surface Analysis Lab

    • Request EMSAL staff to analyze a sample for you

    • Capabilities

    • Staff Consultation

    • On-Campus Rates

    • Industry Rates

  • Services

    • Nanoscribe Photonic Pro GT2 Micro 3D Printing Service (2 Photon Polymerization)

    • Heidelberg DWL66+ Photomask Production and Direct Writing or Grayscale Lithography Service

    • Precious Metals Coating and Patterning (Gold, Platinum, Silver, Iridium, Palladium)

    • Wafer Dicing and Anodic Bonding

    • Custom Biochip Fabrication (microfluidic channels, neural probes, microneedles)

    • Micro/Nano Imaging (Optical and SEM Videos and Microphotographs)

    • WAFER OR THIN FILM ETCHING/PATTERNING: (DRIE, ICP RIE, XeF2 dry silicon isotropic etch, O2 plasma, or wet chemical )

    • If you are…

      • A Student

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      • Interested in Nanotech

      • Preparing to Publish

  • Member Resources

    • Member Door Access Request Form

    • Request Equipment Training or Service

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CEE 200XD Develop Spinner

October 27, 2022

Tool Owner

Brian Baker (bbaker@eng.utah.edu)

S/N: 2122257

Download Files

Files

Lift Off Resist:

Positive Lift Off Resist LOR10B Spec Sheet 1

Positive Lift Off Resist LOR10B Spec Sheet 2

Run-Data Reports for CEE 200XD Develop Spinner

Processes on CEE 200XD Develop Spinner

Download Combined Report (XLS)

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